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	题名	作者	年代	出处	被引量
1	Crystallinity and photo- catalytic activity of TiO2 films deposited by reactive sputtering with radio frequency substrate bias 显示文摘	Song P K lrie Y Shigesato Y	2006	Thin Solid Films2006，496，1：	1
2	Effect of Mn Depletion on Intragranular Ferrite Transformation in Heat Affected Zone of Welding in Low Alloy Steel显示文摘	Shigesato G Sugiyama M	2001	Tetsu-magane2001，87，2：	1
3	Crystallinity and photocatalytic activity of TiO2 films deposited by reactive sputtering with radio frequen cy substrate bias显示文摘	Song P K Irie Y Shigesato Y	2006	Thin Solid Films2006，496，：	1
4	Comparative Study of Heteroepitaxial and Polycrystalline tin-doped Indium Oxide Films 显示文摘	Kamei M Shigesato Y Yasui I	1997	Journal of Non-crystalline Solids1997，218，：	1
5	Characterization of nanostructure of rusts formed on weathering Steel显示文摘	Masao Kimura Tamaki Suzuki Genichi Shigesato	2002	ISIJ International2002，42，：	1
6	Electrical and Structural Properties of Low Resistivity Tin Doped Indium Oxide Films 显示文摘	Shigesato Y Takaki S Haranoh T	1992	Journal of Applied Physics1992，71，：	1
7	Fe ( O, OH) 6 network structure of rust formed on weathering steel surfaces and its relationship with corrosion resistance 显示文摘	Kimura M Suzuki T Shigesato G	2003	Nippon steel technical report2003，87，：	1
8	Characterization of Nanostructure of Rusts Formed on Weathering Steel 显示文摘	Masao Kimura Tamaki Suzuki Genichi Shigesato	2002	ISIJ International2002，42，：	1
9	A microstructural study of low resistivity tin-doped indium oxide prepared by d c magnetron sputtering显示文摘	Yuzo Shigesato David C Paine	1994	Thin Solid Film1994，238，1：	1
10	The structural characteristics of VOx films prepared by He- introduced reactive RF unbalanced magnetron sputtering显示文摘	H Miyazaki F Utsuno Y Shigesato	1996	Thin Solid Films1996，，：	1
11	Characterization of nanostructure of rusts formed on the weathering steel 显示文摘	Kimura M Suzuki T Shigesato G	2002	Journal of the Japan Institute of Metals2002，42，12：	1
12	High rate deposition of photocatalytic TiO2 films by dc magnetron sputtering using a TiO2-x target 显示文摘	SATO Y UEBAYASHI A ITO N KAMIYAMA T SHIGESATO Y	2008	Journal of Vacuum Science and Technology A: Vacuum Surfaces and Films2008，26，4：	1
13	Electrical and Structural Properties of Low Resistivity Tin-doped Indium Oxide Filmd显示文摘	Shigesato Y Takaki S Haranoh I	1992	Appl Phys1992，71，5：	1
14	Electrical and Structural Properties of Low Resistivity Tin - Doped Indium Oxide Films 显示文摘	Shigesato Y Takaki S Haranoh T	1992	Journal of Applied Physics1992，71，7：	1
15	Photocatalytic TiO 2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems显示文摘	S. Ohno N. Takasawa Y. Sato M. Yoshikawa K. Suzuki P. Frach Y. Shigesato	2005	Thin Solid Films2005，，1：	1
16	Development of in situ observa tion technique using scanning ion microscopy and demonstra tion of Mn depletion e显示文摘	Shigesato G Sugiyama M	2002	Journal of Electron Microsco- py2002，51，6：	1
17	Thin film TiO 2 photocatalyst deposited by reactive magnetron sputtering显示文摘	Makiko Yamagishi Shna Kuriki P.K. Song Yuzo Shigesato	2003	Thin Solid Films2003，，1：	1
18	Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO 2 films显示文摘	S. Ohno D. Sato M. Kon P.K. Song M. Yoshikawa K. Suzuki P. Frach Y. Shigesato	2003	Thin Solid Films2003，，2：	1
19	DC sputter deposition of amorphous indium–gallium–zinc–oxide (a-IGZO) films with H 2 O introduction显示文摘	Takafumi Aoi Nobuto Oka Yasushi Sato Ryo Hayashi Hideya Kumomi Yuzo Shigesato	2009	Thin Solid Films2009，，11：	1
20	Electrical and structural properties of tin-doped indium oxide films deposited by DC sputtering at room temperature 显示文摘	Song P Shigesato Y Yasui I	1999	Jpn J Appl Phys1999，38，：	1

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