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74篇 您的检索式:作者名="RITALA M"
    题名 作者 年代 出处 被引量
1Thin film deposition methods for CulnSe2 solar cells 显示文摘KemeU M Ritala M Leskela M 2005Critical Reviews in Solid State and Materials Sciences2005,30,1:1
2Atomic layer deposition of gadolinium oxide films 显示文摘Kukli K Hatanpaa T Ritala M 2007Chemical Vapor Deposition2007,13,:1
3显示文摘Vehkamaki M Hanninen T Ritala M 2001Chem Vap Deposition2001,7,:1
4Atomic Layer Deposition 显示文摘RITALA M LESKELA M 2001Handbook of Thin Film Materials2001,,1:1
5Atomic Layer Deposition (ALD) : From Precursors to Thin Film Structures 显示文摘LESKELA M RITALA M 2002Thin Solid Films2002,409,1:1
6Atomic Layer Deposition Chemis- try : Recent Developments and Future Challenges 显示文摘LESKELA M RITALA M 2003Ange- wandte Chemie International Edition2003,42,45:1
7Atomic layer deposition of oxide thin films with metal alkoxides as oxygen sources显示文摘Ritala M Kukli K 2000Science2000,288,4:1
8H2S modified atomic layer deposition process for photocatalytic TiO2 thin films显示文摘Pore V Ritala M Leskela M 2007Journal of Materials Chemistry2007,17,14:1
9Atomic Layer Deposition (ALD) : from Precursors to Thin Film Structures 显示文摘Leskela M Ritala M 2002Thin Solid Films2002,409,1:1
10Expression of Jungal thermotolerant endo-1, 4-,3 glucanase in transgenic barley seeds during germination显示文摘Nuutila A M Ritala A Skadsen R W 1999Plant Molecular Biolo- gy1999,41,:1
11Constituents of radical innovation : Exploring the role of stra- tegic orientations and market uncertainty 显示文摘Sainio L M Ritala P Hurmelinna-Laukkanen P 2012Technovation2012,32,11:1
12Ale growth of transpar-ent conductors 显示文摘Ritala M Asikanen T Leskela M 1996Mater Res Soc Symp Proc1996,426,:1
13Atomic layer deposition in nanometer-level replication of cellulosic substances and preparation of photocatalytic TiO2/cellulose composites 显示文摘KEMELL M PORE V RITALA M 2005Journal of the American Chemical Society2005,127,14:1
14Atomic Layer Deposition (ALD): from Precursors to Thin Film Structures 显示文摘LESKELA M RITALA M 2002Thin Solid Films2002,409,13:1
15The characterstic of ZnO for the use of flat panel display electrodes 显示文摘RITALA M ASIKANEN T LESKELA M 1996Mater Res Soc Sym Proc1996,426,:1
16Ruthenium thin films grown by atomic layer deposition 显示文摘AALTONEN T ALEN P RITALA M 2003Chem Vap Deposition2003,9,1:1
17Atomic layer epitaxy growth of tantalum oxide thin films from Ta(OC2H5)5 and H2O 显示文摘KUKLI K RITALA M LESKELA M 1995Journal of the Electrochemical Society1995,142,5:1
18Atomic layer deposition(ALD):from precursors to thin film structures显示文摘LESKELA M RITALA M 2002Thin Solid Films2002,409,1:1
19Factors affect-ing the regeneration capacity of isolated barley microspores显示文摘RITALA A MANNONEN L OKSMAN-CALDENTEY K M 2001Plant CellRep2001,20,:1
20ALD of rho- dium thin films from Rh (acac)3 and oxygen 显示文摘AALTONEN T RITALA M LESKELA M 2005Electro- chem Solid-State Lett2005,8,8:1
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