维普期刊资源整合服务平台（V6.5）

35篇 您的检索式：作者名="Depla D"

选中清除导出查看参考文献查看引证文献引用追踪共2页首页上一页第1页下一页末页 /2 跳转

	题名	作者	年代	出处	被引量
1	TiO2 films prepared by DC magnetron sputtering from ceramic targets显示文摘	Tomaszewski H Poelman H Depla D etal	2003	Vacuum2003，68，：	1
2	Biaxial Alignment in Sputter Deposited Thin Films显示文摘	Mahieu S Ghekiere P Depla D	2006	Thin Solid Films2006，515，4：	1
3	显示文摘	Poelman H Poelman D Depla D	2001	Surface Science2001，482，：	1
4	Determination of the V2p XPS binding energies for different vanadium oxidation states (Vs+ toV+ ) 显示文摘	Silversmit G Depla D Poelman H	2004	Journal of Electron Spectroscopy and Related Phenomena2004，135，16：	1
5	Rational design of a multiepitope vaccine encoding T-lymphocyte epitopes for treatment of chronic hepatitis B virus infections显示文摘	Depla E Van der Aa A Livingston B D	2008	J Virol2008，82，1：	1
6	Determination of the V2p XPS binding energies for different vanadium oxidation states (V^5+to V^0+) 显示文摘	Silversmit G Depla D Poelman H	2004	Journal of Electron Spectroscopy & Related Phenomena2004，135，23：	1
7	Rotatable Magnetron Sputtering:downscaling for Better Understanding显示文摘	Gryse R D Depla D Mahieu S	2011	Materials Technology2011，26，1：	1
8	Monte Carlo simulation of the transport of atoms in DC magnetron sputtering显示文摘	Mahieu S Buyle G Depla D	2006	Nuclear instruments and methods in physics research B2006，243，：	1
9	Humoral immune response in acute hepatitis C virus infection显示文摘	Netski D M Mosbruger T Depla E etal	2005	Clin Infect Dis2005，41，5：	1
10	Influence of oxygen addition on the target voltage during reactive sputtering of aluminium显示文摘	Depla D De Gryse R	2001	Plasma Sources Sci Techno12001，10，：	1
11	Simplified model for calculating the pressure dependence of a direct current planar magnetron discharge 显示文摘	Buyle G Depla D Eufinger K	2003	J Vac Sci Technol A2003，21，4：	1
12	Inhibition of hepatitis C virus-like particle binding to target cells by antiviral antibodies in acute and chronic hepatitis C 显示文摘	Steinmann D Barth H Gissler B Schiirmann P Adah MI Gerlach JT Pape GR Depla E Jacobs D Maertens G Patel AH Inchausp6 G Liang TJ Blum HE Baumert TF	2004	J Virol2004，78，17：	1
13	Recapture of seeondary electrons by the target in a DC planar magnetron discharge显示文摘	Buyle G Bosscher W De Depla D	2003	Vacuum2003，70，：	1
14	Simplified model for the DC planar magnetron discharge显示文摘	Buyle G Depla D Eufinger K	2004	Vacuum2004，74，：	1
15	Monte Carlo simulation of the transport of atoms in DC magnetron sputtering显示文摘	Mahieu S Buyle G Depla D	2006	Nuclear Instruments and Methods in Physics Research B2006，243，：	1
16	Determination of the V2p XPS binding energies for different vanadium oxidation states (V5+ to V0+)显示文摘	Silversmit G Depla D Poelman H	2004	J Electron Spectrosc Relat Phenom2004，135，23：	1
17	显示文摘	Silversmit G Depla D Poelman H	2004	J Electron Spectrosc Relat Phenom2004，135，23：	1
18	Biaxial Alignment in Sputter Deposited Thin Films显示文摘	Mahieu S Ghekiere P Depla D	2006	Thin Solid Films2006，515，4：	1
19	Rational design of a multiepitope vaccine encoding T-lymphocyte epitopes for treatment of chronic hepatitis B virus infections 显示文摘	DEPLA E VAN DERAA A LIVINGSTON B D	2008	J Virol2008，82，1：	1
20	High Power Impulse Magnetron Sputtering Using a Rotating Cylindrical Mngnetron 显示文摘	Leroy W P Mahieu S Depla D	2010	Vac Sci Teehnol2010，28，：	1

返回顶部每页显示：

共2页首页上一页第1页下一页末页 /2 跳转

互联网出版许可证新出网证(渝)字10号全国400电话 - 免长途话费

用户提示